LongarmmanipulatorforstandardmechanicalinterWord下载.docx
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LongarmmanipulatorforstandardmechanicalinterWord下载.docx
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SEALEDSTANDARDINTERFACEAPPARATUS;
Inventors:
GeorgeAllenManey,AndrewWilliamO'
Sullivan,W.GeorgeFaraco;
Ser.No.:
635,384;
Filed:
July30,1984.
BOXDOORACTUATEDRETAINER;
Ser.No.686,443;
Dec.24,1984.
SHORTARMMANIPULATORFORSTANDARDMECHANICALINTERFACEAPPARATUS;
AnthonyCharlesBonora;
Ser.No.769,850;
Aug.26,1985.
FIELDOFTHEINVENTION
Thepresentinventionrelatestomanipulatingapparatusforstandardizedmechanicalinterfacesystemsforreducingparticlecontaminationandmoreparticularlytoapparatustransferringcassettescontainingarticlestobeprocessedintoandoutofsealedcontainerssuitableforuseinsemiconductorprocessingequipmenttopreventparticlecontamination.
BACKGROUNDOFTHEINVENTION
Astandardizedmechanicalinterface(SMIF)hasbeenproposedtoreduceparticlecontaminationbysignificantlyreducingparticlefluxesontowafers.Thisendisaccomplishedbymechanicallyensuringthatduringtransport,storageandprocessingofthewafers,thegaseousmedia(suchasairornitrogen)surroundingthewafersisessentiallystationaryrelativetothewafersandbyensuringthatparticlesfromtheambientoutsideenvironmentdonotentertheimmediateinternalwaferenvironment.
Controlofparticulatecontaminationisimperativeforcosteffective,high-yieldingandprofitablemanufacturingofVLSIcircuits.Becausedesignrulesincreasinglycallforsmallerandsmallerlinesandspaces,itisnecessarytoexertgreaterandgreatercontrolonthenumberofparticlesandtoremoveparticleswithsmallerandsmallerdiameters.
Somecontaminationparticlescauseprocessdefects,suchanincompleteetchinginspacesbetweenlinesleadingtoanunwantedelectricalbridge.Inadditiontosuchphysicalprocessdefects,othercontaminationparticlesmaycauseelectricalfailureduetoinducedionizationortrappingcentersingatedielectricsorjunctions.
Modernprocessingequipmentmustbeconcernedwithparticlesizeswhichrangefrombelow0.01micrometerstoabove200micrometers.Particleswiththesesizescanbeverydamaginginsemiconductorprocessing.Typicalsemiconductorprocessestodayemploygeometrieswhichare1micrometerandunder.Unwantedcontaminationparticleswhichhavegeometriesmeasuringgreaterthan0.1micrometersubstantiallyinterferewith1micrometergeometrysemiconductordevices.Thetrend,ofcourse,istohavesmallerandsmallersemiconductorprocessinggeometries.
Intypicalprocessingenvironmentstoday,"
cleanrooms"
areestablishedinwhich,throughfilteringandothertechniques,attemptsaremadetoremoveparticleshavinggeometriesof0.03micrometerandabove.Thereisaneed,however,toimprovetheprocessingenvironment.Theconventional"
cleanroom"
cannotbemaintainedasparticlefreeasdesired.Itisvirtuallyimpossibletomaintainconventionalcleanroomsfreeofparticlesofa0.01micrometersizeandbelow.
Themainsourcesofparticulatecontaminationarepersonnel,equipment,andchemicals.Particlesgivenoffbypersonnelaretransmittedthroughtheenvironmentandthroughphysicalcontactormigrationontothewafersurface.People,bysheddingofskinflakes,forexample,areasignificantsourceofparticlesthatareeasilyionizedandcausedefects.Althoughcleanroomgarmentsreduceparticleemissionstheydonotfullycontaintheemissions.Ithasbeenfoundthatasmanyas6000particlesperminuteareemittedintoanadjacentonecubicfootofspacebyafullysuitedoperator.
Tocontrolcontaminationparticles,thetrendintheindustryistobuildmoreelaborateandexpensivecleanroomswithHEPAandULPArecirculatingairsystems.Filterefficienciesof99.999%anduptotencompleteairexchangesperminutearerequiredtoobtainanacceptablelevelofcleanliness.
Tominimizeprocessdefects,processingequipmentmanufacturersmustpreventmachinegeneratedparticlesfromreachingthewafers,andsuppliersofgasesandliquidchemicalsmustdelivercleanerproducts.Mostimportant,asystemmustbedesignedthatwilleffectivelyisolatewafersfromparticlesduringstorage,transportandtransferintoprocessingequipment.TheStandardMechanicalInterface(SMIF)systemhasbeenproposedtoachievethisgoal.TheSMIFconceptisbasedontherealizationthatasmallvolumeofstill,particle-freeair,withnointernalsourceofparticles,isthecleanestpossibleenvironmentforwafers.Furtherdetailsofoneproposedsystemaredescribedinthearticle"
SMIF:
ATECHNOLOGYFORWAFERCASSETTETRANSFERINVLSIMANUFACTURING"
byMihirParikhandUlrichKaempf,SolidStateTechnology,July1984,pp.111-115andintheabovecross-referencedapplications.
TheproposedSMIFsystemhasthreemaincomponents,namely,
(1)minimumvolume,dustproofcontainersareusedforstoringandtransportingwafercassettes;
(2)canopiesareplacedovercassetteportsofprocessingequipmentsothattheenvironmentsinsidethecontainersandcanopiesbecomeminiaturecleanspaces;
(3)doorsonthecontainersaredesignedtomatewithdoorsontheinterfaceportsontheequipmentcanopiesandthetwodoorsareopenedsimultaneouslysothatparticleswhichmayhavebeenontheexternaldoorsurfacesaretrapped("
sandwiched"
)betweenthedoors.
IntheproposedSMIFsystem,acontainerisplacedattheinterfaceportontopofthecanopy;
latchesreleasethecontainerdoorandthecanopyportdoorsimultaneously.Amechanicalelevatorlowersthetwodoors,withthecassetteridingontop,intothecanopycoveredspace.Amanipulatorpicksupthecassetteandplacesitontothecassetteport/elevatororotherlocationwithinthecanopyoftheequipment.Afterprocessing,thereverseoperationtakesplace.
TheSMIFsystemhasbeenprovedeffectivebyexperimentsusingprototypeSMIFcomponentsbothinsideandoutsideacleanroom.TheSMIFconfigurationachievedatenfoldimprovementovertheconventionalhandlingofopencassettesinsidethecleanroom.
However,duetothespacelimitationswithinthecanopyoftheprocessingstation,thesizeandconfigurationoftheelevatorsandmanipulatorsisimportant.Furthermoreitisdesirablethattheequipmentforremovingthecassetteholdingarticlestobeprocessedfromthestandardmechanicalinterfacecontainerbeconfinedtoasmallspacewhennotinusewhileprovidingalongreachtoadjacentequipment.
SUMMARYOFTHEINVENTION
Thepresentinventionisamanipulatorfortransferringacassette,holdingarticlestobeprocessed,toandfromacontainersupportedataprocessingstation.Theprocessingstationhasacassetteportforreceivingthecassettewhenthecassettemovesalongacentralaxisextendingfromoutsidetheprocessingstation,throughthecassetteport,andintotheprocessingstation.Acassetteplatformforsupportingthecassetteistransportablealongtheaxisfortransferringthecassettetoandfromthecontaineralongthecentralaxis.Amanipulatorisprovidedfortransferringthecassettetoandfromthecentralaxistoalocationoffsetfromtheaxiswherebythecassetteplatformcantravelalongtheaxispastthecassetteinabypassingrelation.
Themanipulatorincludesanarminanarrangementhavingapivotlocatedonandattachedtoanarmplatform.Thepivotarmlengthtogetherwiththelocationofthepivotpointonthearmplatformestablishesamechanismwhichmaximizesthereachfromthecentralaxiswhilestillpermittingtheco-axialloadingandunloading,inabypassingrelationship,ofthecassettefromandtothecassetteplatform.
Thepresentinventionmaximizestheamountofreachofthecassettewhichcanbeco-axiallyloadedandunloadedfromthecassetteplatform.Thislong-armfeatureisparticularlyusefulwhenthepresentinventionisadaptedtoSMIFprocessingapparatusinacleanroomenvironmentwherethereachdimensionneedstobelarge.
Additionalobjectsandfeaturesoftheinventionwillappearfromthefollowingdescriptioninwhichthepreferredembodimentsoftheinventionhavebeensetforthindetailinconjunctionwiththedrawings.
BRIEFDESCRIPTIONOFTHEDRAWINGS
FIG.1isaperspectiveviewofthemanipulatoraccordingtothepresentinventionwithasimplifieddepictionofaprocessingstation.
FIG.2throughFIG.6aresideviewdrawingsofthemanipulatoraccordingtothepresentinventionusedindescriptionofthemanipulationofacassetteholdingarticlestobeprocessedfromaSMIFcontainerintotheprocessingstation.
FIG.7isabackviewofthemanipulatoraccordingtothepresentinventionshowingameansfortransportingtheplatformsalongtheshaft.
FIG.8isasideviewdrawingofoneembodimentofthemanipulatoraccordingtothepresentinventionhavingamanipulatorarmwithamovablepivotpointonacarriageonthesecondplatform.
DETAILEDDESCRIPTION
WithreferencetotheFigures,adetaileddescriptionofpreferredembodimentforthepresentinventionisdescribed.
FIG.1showsaperspectiveviewofthemanipulator1ofthepresentinventionmountedwithasimplifieddepictionofaprocessingstation2withwhichthemanipulator1isused.Theprocessingstation2includesabody3inwhichaprocessingstepisconducted.Forinstance,whenthearticlestobeprocessedaresemiconductorwafers,theprocessingstationmayoperatetoplacealayerofphotoresistonthesurfaceofthewafer.Ofcourse,manyotherprocessingstepsmaybea
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