Substrate having a modified native oxide layer for improved electrical conductivityWord文档下载推荐.docx
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Substrate having a modified native oxide layer for improved electrical conductivityWord文档下载推荐.docx
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Whatisclaimedis:
1.Asubstrateofimprovedelectricalconductivity,thesubstratecomprising:
a)thesubstratebeingselectedfromthegroupconsistingofGroupIVA,GroupVAandGroupVIAmetals,aluminum,manganese,nickel,copper,stainlesssteel,andalloysandmixturesthereof;
b)anativeoxidelayeronasurfaceofthesubstrate;
and
c)ametalcharacterizedashavingbeenintermixedwiththenativeoxidelayerbyahigh-energybeamhavingbeendirectedtothemetaldepositedonthenativeoxidelayer,themetalselectedfromthegroupconsistingofGroupIAandGroupVIIIAmetals.
2.Thesubstrateofclaim1whereinthehigh-energybeamisalaserbeam.
3.Thesubstrateofclaim1whereinthehigh-energybeamisanionbeam.
4.Thesubstrateofclaim1whereinthemetalisintermixedwiththenativeoxideinaraster-likepattern.
5.Thesubstrateofclaim1whereinthenativeoxidelayerischaracterizedashavingbeenchangedfrombeingelectricallyinsulatingtobeingmoreelectricallyconductivebyvirtueoftheintermixedmetal.
6.Thesubstrateofclaim1whereinthemetalintermixedwiththenativeoxidelayerdoesnotaffectthebulkstructureofthesubstrate.
7.Thesubstrateofclaim1whereinthemetalischaracterizedashavingbeensequentiallydepositedandintermixedwiththenativeoxidelayertoprovideapredeterminedmixeddepth.
8.Thesubstrateofclaim1whereinthesubstratehasathicknessoffromabout0.001mmtoabout2.0mm.
9.Thesubstrateofclaim1whereinthemetalischaracterizedashavingbeenintermixedwiththenativeoxidelayeratatemperatureofabout100.degree.C.orless.
10.Thesubstrateofclaim1furtherincludingacoatingonthenativeoxidelayerofanelectrodematerialrenderingthesubstrateuseableasanelectrodeinacapacitor.
11.Thesubstrateofclaim10whereintheelectrodematerialisselectedfromthegroupconsistingofruthenium,iridium,manganese,nickel,cobalt,tungsten,niobium,iron,molybdenum,palladium,platinum,leaddioxide,polyaniline,polypyrole,polythiophene,andmixturesthereof.
12.Thesubstrateofclaim1whereinthemetalischaracterizedashavingathicknessofabout50angstromstoabout1,000angstromspriortobeingintermixedwiththenativeoxidelayer.
13.Thesubstrateofclaim1whereinthemetalisintermixedintothenativeoxidelayertoadepthofabout0.04.mu.toabout0.06.mu..
14.Thesubstrateofclaim1whereinthesubstrateisoftantalumortitaniumandthemetalisofpalladium.
15.Thesubstrateofclaim10whereintheelectrodemetalisrutheniumoxide.
16.Asubstrateofimprovedelectricalconductivity,thesubstratecomprising:
a)thesubstratebeingoftantalumortitanium;
c)palladiumintermixedwiththenativeoxidelayer;
d)rutheniumoxideprovidedonthenativeoxidelayerintermixedwiththepalladium.
17.Thesubstrateofclaim2whereinthelaserbeamhasapulserateof80andadarknessfactorof10,000.
18.Thesubstrateofclaim3whereintheionbeamhasanenergylevelofabout2,000keV.
19.Asubstrateofimprovedelectricalconductivity,thesubstratecomprising:
a)thesubstrateselectedfromthegroupconsistingofGroupIVA,GroupVAandGroupVIAmetals,aluminum,manganese,nickel,copper,stainlesssteel,andalloysandmixturesthereof;
c)ametalintermixedwiththenativeoxidelayer,themetalselectedfromthegroupconsistingofGroupIAandGroupVIIIAmetals,whereinthemetalintermixedwiththenativeoxidelayerdoesnotaffectthebulkstructureofthesubstrate.
20.Asubstrateofimprovedelectricalconductivity,thesubstratecomprising:
c)ametalintermixedwiththenativeoxidelayeratatemperatureofabout100.degree.C.orless,themetalselectedfromthegroupconsistingofGroupIAandGroupVIIIAmetals.
21.Asubstrateofimprovedelectricalconductivity,thesubstratecomprising:
c)ametalintermixedwiththenativeoxidelayer,themetalselectedfromthegroupconsistingofGroupIAandGroupVIIIAmetals;
d)acoatingonthenativeoxidelayerofanelectrodematerialrenderingthesubstrateuseableasanelectrodeinacapacitor.
22.Thesubstrateofclaim21whereintheelectrodematerialisselectedfromthegroupconsistingofruthenium,iridium,manganese,nickel,cobalt,tungsten,niobium,iron,molybdenum,palladium,platinum,leaddioxide,polyaniline,polypyrole,polythiophene,andmixturesthereof.
23.Thesubstrateofclaim21whereintheelectrodemetalisrutheniumoxide.
Description
BACKGROUNDOFTHEINVENTION
Thisinventionrelatestotheartoftreatingmetals,metalalloysandmetaloxides,andmoreparticularlytoanewandimprovedmethodforenhancingtheelectricalconductivityofmetals,metalalloysandmetaloxides.
Oneareaofuseofthepresentinventionisinthemanufacturingofelectrodesforcapacitors,batteriesandthelike,althoughtheprinciplesofthepresentinventioncanbevariouslyapplied.Metalsandmetalalloyshaveanativeoxidepresentonthesurface.Thisisaninsulatinglayerandhenceifthematerialistobeusedasasubstrateforanelectrode,theoxidehastoberemovedormadeelectricallyconductive.
Iftheoxideisremovedbychemicaltreatment,suchasbyetchingwithanacidorelectrolyticetchingtoexposetheunderlyingmetal,specialstepsmustbetakeninordertocompletetheelectricalcontactsbeforethenativeoxidecanberegeneratedandinterferewiththeelectricalcontacts.Suchmeasuresrequirespecialapparatusandextremelycarefulhandlingofthematerials,allofwhichaddscosttothefabricatingofelectricaldevicesincorporatingthesematerialstowhichelectricalcontactmustbemade.Anotherapproachinvolvesremovingtheoxidelayerandplatingthebaresubstratemetalwithanexpensivenoblemetal,suchassilver,gold,oralloysofsilver,goldandplatinum,ortheformationofanelectricallyconductingcompoundonthebaresubstratesurface.Thematerialsemployedareexpensiveandthestepsrequiredtoplatethesubstratearecostlyandtimeconsuming.Inaddition,themetalplatingorelectricallyconductingcompoundmustbedisposedonthesubstrateasacontinuousfilmformaximumperformance.Therefore,theplatingorcompoundformationtypicallyiscarriedoutafterthesubstratemetalisformedintoitsfinalshapefortheelectricaldeviceinwhichitisincorporatedinordertoavoiddamagetothecoating.This,inturn,addstothecostandcomplexityofthemanufacturingprocess.
U.S.Pat.No.5,098,485issuedMar.24,1992toDavidA.Evansproposesasolutiontotheoxideproblembyalteringthenativeoxidefromanelectricallyinsulatingtoanelectricallyconductingconditionwithoutremovalofthenativeoxidelayertoexposetheunderlyingmetaloralloy.Asolutioncontainingionsofanelectricalmaterialisappliedtothenativeoxidelayer,andthenthesubstrate,oxideandappliedionsareheatedtoanelevatedtemperatureforatimesufficienttoincorporatetheionsintotheoxidelayertochangeitfromanelectricalinsulatortoanelectricalconductor.
SUMMARYOFTHEINVENTION
Itwould,therefore,behighlydesirabletoprovideanewandimprovedmethodforenhancingtheelectricalconductivityofmetals,metalalloysandmetaloxideswhichdoesnotrequireadditionalheattreatment,whichprovidescontroloverthedensityanddepthofthematerialintroducedtothetreatedsurface,whichcanbeperformedinamannerpreventingsubstratedegradationanddeformation,andwhichimprovesthequalityofthetreatedsurface.
Thepresentinventionprovidesamethodforimprovingtheelectricalconductivityofasubstrateofmetal,metalalloyormetaloxidecomprisingdepositingasm
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